Novel Photon Capture Methods for Multicrystalline Silicon

Semiconductor and Silicon PV group – Oxford Materials

In order to move to a low-carbon future, and avoid the worst effects of anthropogenic climate change, continuing reductions in the cost of renewable energy are required. The semiconductor group at Oxford Materials, in collaboration with international research partners at Fraunhofer ISE in Germany and the University of New South Wales in Australia as well as industry partners, is working to reduce the cost of photovoltaic cells. Graduate students would work as part of a dedicated group of researchers on state-of-the-art techniques for improving the performance of crystalline silicon solar cells, which account for over 90% of all currently manufactured solar cells.

Texturing of multicrystalline silicon wafers for solar cell production has been an ongoing concern for cell manufacturers. While anisotropic texturing of mono-crystalline silicon can reduce the weighted average reflection (WAR) of bare silicon to below 10%, most approaches on multicrystalline materials yield WAR’s in excess of 25%. Furthermore the traditional approach of using acidic etching solutions to preferentially attack defect sites is incompatible with new wafer sawing techniques. In this project the graduate student will develop novel texturing approaches for multicrystalline silicon. These techniques will be evaluated in collaboration with international research institutions and industrial partners including cell manufactures and wafer suppliers. If successful this technology will reduce the cost of solar electricity by realizing superior optical performance with a reduced cost of production.
 

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