Ion charged dielectrics are a class of thin-film material that possess a permanent charge. The charge storage capability of these materials makes them essential to a wide range of applications, from telecommunications to air filters and biomedical devices. At Oxford Materials, we have developed new methods to produce substantial concentrations of charge in dielectric thin films, in to fully exploit their potential in making of devices. This project aims to discover new dielectric-ion combinations and apply them to the manufacture of optoelectronic devices, like solar cells, photodetectors, and photodiodes. The project will involve establishing a reproducible and controllable method of growing nanometre scale thin films using different synthesis methods, followed by delivery of new precursor ions, and their drive in into the dielectric. After the methodology is stablished the novel ion-charged dielectric systems can be integrated into devices, and their performance will need to be characterised. This project requires hands-on electrical and optical measurements of materials, as well as data processing, analysis, and modelling of the observed current transport characteristics. Ultrathin dielectric films will be employed in the next generation of silicon solar cells to produce architectures with minimum losses. As such this project feed in the Lab’s aim of improving future photovoltaics technology to help accelerate the green energy transition.
The description above outlines a possible new research project being offered to prospective new postgraduate students.